Adaptive Modeling and H∞ Control for Photolithography Manufacturing Process
نویسندگان
چکیده
A run-by-run feedback controller is designed for Intel manufacturing fabs to stabilize the critical dimension in the process of photolithography, in the presence of unpredictable process drift and unknown non-Gaussian disturbances. The controller is a combination of an adaptive model with an H∞ feedback.
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تاریخ انتشار 2004